Excerpts from Report 


EUVL is a Next Generation technology, keeping Moore’s law alive and targeting shorter wavelength to aim at Fine-line Lithography. Although the drawbacks are many,it has scope for improvement and the challenges of chip dimension miniaturization can be achieved. EUVL machines are already in the market(from companies such as ASML,CYMER),with IC fabricators experimenting its scope on their chip- making proces. The IC optical lithography technique doesn’t stop with this. It is hoped that,by 2014,leading edge manufacturers will incorporate this into mass production and thereby serve as a boon to VLSI technology Also See Latest IEEE Seminar Topics For ECE | EEE - 2014

Download - IEEE Format Report ( 2 Pages )

Post a Comment Blogger

 
Top